Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1990-06-08
1992-05-12
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430296, 430967, 428427, 428428, 378 35, G03F 900
Patent
active
051127075
ABSTRACT:
A mask structure for lithography including an annular base plate supporting a peripheral portion of a masking-material-holding film provided on a surface thereof with a desired pattern of the making material is provided which is characterized in that the masking-material-holding film and the base plate are bonded together at an outer peripheral surface, which is connected smoothly or with an appropriate angle to the topmost flat end surface of the base plate and is at a lower level than the topmost flat end surface of the base plate, or at a surface contiguous to the outer peripheral surface.
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patent: 4111698 (1978-09-01), Sato
patent: 4171489 (1979-10-01), Adams et al.
patent: 4579616 (1986-04-01), Windischmann
patent: 4677042 (1987-06-01), Kato et al.
patent: 4804600 (1989-02-01), Kato et al.
patent: 4956249 (1990-09-01), Kato et al.
Kato Hideo
Matsushita Keiko
Shibata Hirohumi
Takamatsu Osamu
Bowers Jr. Charles L.
Canon Kabushiki Kaisha
Neville Thomas R.
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