Mask structure for lithography

Details Mask structure for lithography Mask structure for lithography

1989-08-25

1990-09-11

Dees, Jose

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430967, 428427, 428428, 378 35, G03F 100

Patent

active

049562495

ABSTRACT:
A mask structure for lithography comprising an annular base plate supporting a peripheral portion of a masking-material-holding film provided on a surface thereof with a desired pattern of the masking material is provided which is characterized in that the masking-material-holding film and the base plate are bonded together at an outer peripheral surface, which is connected smoothly or with an appropriate angle to the topmost flat end surface of the base plate and is at a lower level than the topmost flat end surface of the base plate, or at a surface contiguous to the outer peripheral surface.

REFERENCES:
patent: 4037111 (1977-07-01), Coquin et al.
patent: 4111698 (1978-09-01), Sato
patent: 4171489 (1979-10-01), Adams et al.
patent: 4579616 (1986-04-01), Windischmann et al.
patent: 4677042 (1987-06-01), Kato et al.

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