Mask set mismatch

Details Mask set mismatch Mask set mismatch

1982-06-07

1983-06-14

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 356401, 356399, 355 40, G03C 506

Patent

active

043883869

ABSTRACT:
A method for marking a mask set to insure minimum mismatch between the masks when they are assembled into a set. Each mask in the set is evaluated against a known fixed standard, identified and marked such that when the set is assembled and utilized to produce an integrated circuit minimum mismatch between each element in each mask in the set will be realized.

REFERENCES:
patent: 4070117 (1978-01-01), Johannsmeier et al.
patent: 4103998 (1978-08-01), Nakazawa et al.
patent: 4134066 (1979-01-01), Vogel et al.
patent: 4153367 (1979-05-01), Lietar et al.
patent: 4193687 (1980-05-01), Reekstin et al.
patent: 4251160 (1981-02-01), Bouwhuis et al.
Coffey, P. H., "An X-Y Measuring System," Kodak Micro-Electronics Seminar Proceedings, Oct. 1-3, 1978, pp. 1-14.
Rottmann, H. R., "Overlay in Lithography," Semiconductor International, Dec. 1980, pp. 83-94.

Affiliated with

Also associated with

Rating

Mask set mismatch does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask set mismatch, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask set mismatch will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-164144