Mask set having separate masks to form different regions of...

Details Mask set having separate masks to form different regions of... Mask set having separate masks to form different regions of...

2008-06-10

2008-06-10

Huff, Mark F. (Department: 1795)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C430S005000, C430S311000

Reexamination Certificate

active

07385676

ABSTRACT:
A mask set for the production of integrated circuit chips, wherein a first mask has first features that form inner cell regions and a second mask has second features that form outer non-cell regions, so that the first and second masks do no expose a same region of a semiconductor wafer. An exposure system includes the mask set with an aperture device to fade out partial regions of the first features during exposure of the wafer by a light source. Furthermore, the mask set is used in a method of exposing a wafer for producing integrated circuit chips.

REFERENCES:
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patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5670428 (1997-09-01), Beilstein et al.
patent: 5807649 (1998-09-01), Liebmann et al.
patent: 6192290 (2001-02-01), Adams
patent: 6537867 (2003-03-01), Freyman et al.
patent: 2002/0006555 (2002-01-01), Hasegawa et al.
patent: 2002/0045136 (2002-04-01), Fritze et al.
patent: 2003/0219655 (2003-11-01), Sutani et al.

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