Mask reuse in semiconductor processing

Details Mask reuse in semiconductor processing Mask reuse in semiconductor processing

2011-08-16

2011-08-16

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

07998640

ABSTRACT:
A mask is reused to form the same pattern in multiple layers in semiconductor processing. Reference marks that allow alignment accuracy to be checked are also formed with the mask. The manner of using the mask advantageously mitigates interference between reference marks in different layers.

REFERENCES:
patent: 5308682 (1994-05-01), Morikawa
patent: 5892291 (1999-04-01), Narimatsu et al.
patent: 5936311 (1999-08-01), Watrobski et al.
patent: 5960296 (1999-09-01), Auzino et al.
patent: 6071656 (2000-06-01), Lin
patent: 6238939 (2001-05-01), Wachs et al.
patent: 6362491 (2002-03-01), Wang et al.
patent: 6589713 (2003-07-01), Okoroanyanwu
patent: 6617669 (2003-09-01), Saito
patent: 6627530 (2003-09-01), Li et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6949462 (2005-09-01), Yang et al.
patent: 7071565 (2006-07-01), Li et al.
patent: 7234244 (2007-06-01), Lindberg
patent: 7553611 (2009-06-01), Chen et al.
patent: 2004/0207097 (2004-10-01), Carpi et al.
patent: 2004/0259322 (2004-12-01), Lu et al.
patent: 2006/0222962 (2006-10-01), Chen et al.
patent: 2229419 (1990-09-01), None
patent: 10-1998-0016943 (1998-06-01), None
patent: WO 2006/105326 (2006-10-01), None
International Search Report for Application # PCT/US2008/068273 Dated Jan. 28, 2009.
Non Final Office Action for U.S. Appl. No. 11/772,130, Dated Mar. 24, 2009.
Non-Final Office Action from U.S. Appl. No. 11/772,128 dated April 28, 2009.
Non-Final Office Action for related U.S. Appl. No. 11/772,128 dated Feb. 23, 2010.
Notice of Allowance for U.S. Appl. No. 11/772,130 dated Jan. 11, 2010.
Final Office Action for U.S. Appl. No. 11/772,130 dated Oct. 20, 2009.
Notice of Allowance cited in related U.S. Appl. No. 11/772,128 dated Jul. 13, 2010.
Notice of Allowance cited in related U.S. Appl. No. 11/772,130 dated Jun. 28, 2010.
Final Office Action cited in related U.S. Appl. No. 11/772,128 dated Oct. 8, 2009.
Restriction/Election cited in related U.S. Appl. No. 11/772,130 dated Nov. 28, 2008.
Notice of Allowance cited in related U.S. Appl. No. 11/772,130 dated Sep. 15, 2010.
First Office Action in Related Chinese Application No. 200880022858.0 dated Jan. 19, 2011.

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