Mask protective device

Details Mask protective device Mask protective device

1995-08-10

1997-02-11

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428 14, 428422, G03F 900

Patent

active

056019556

ABSTRACT:
An opening end face of a frame is closed by a transparent thin film, a vent is formed in the frame, and a filter having a filtration area larger than the sectional area of the vent is mounted to the frame to cover the vent. The filtration area of the filter is an effective area that allows the passage of gas in the filter. Then, the filter is mounted to the frame so that there is a certain space between the frame and the filter. In the conventional device, since the filter is directly mounted to the frame without space between the filter and the frame, the filtration area of the filter is substantially the same as the sectional area of the vent. In case of mounting the filter apart from the frame, however, the filtration area of the filter can be lager than the sectional area of the vent so that the quantity of gas flow is greater than that of the conventional one. Therefore, its adaptability to the changes in atmospheric pressure and in temperature is also improved.

REFERENCES:
patent: 4833051 (1989-05-01), Imamura
patent: 5344677 (1994-09-01), Hong
Research Disclosures, Dec. 1986, Havants, Hants, UK, p. 715, abstract No. 27231.

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