Mask producing method

Details Mask producing method Mask producing method

1995-06-05

1997-10-07

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430314, 430313, 430396, G03F 900

Patent

active

056746466

ABSTRACT:
A mask includes a transparent layer which is transparent with respect to a light which is used for an exposure, and a mask pattern layer which is formed on the transparent layer. At least a portion of the mask pattern layer is made up solely of a phase shift layer for transmitting the light, so that a phase shift occurs between a phase of the light transmitted through the phase shift layer and a phase of the light transmitted through a portion of the mask having no phase shift layer.

REFERENCES:
patent: 4890309 (1989-12-01), Smith
patent: 5045417 (1991-09-01), Okamoto
patent: 5132186 (1992-07-01), Takeuchi et al.

Affiliated with

Also associated with

Rating

Mask producing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask producing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask producing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2355583