Mask plate design

Details Mask plate design Mask plate design

2007-04-10

2007-04-10

King, Roy (Department: 1742)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S22400M, C204S242000, C204S275100, C204S284000, C205S123000, C205S137000, C205S291000, C205S651000, C205S662000, C205S663000, C451S028000, C451S177000

Reexamination Certificate

active

09960236

ABSTRACT:
The present invention includes a mask plate design that includes at least one or a plurality of channels portions on a surface of the mask plate, into which electrolyte solution will accumulate when the mask plate surface is disposed on a surface of wafer, and out of which the electrolyte solution will freely flow. There are also at least one or a plurality of polish portions on the mask plate surface that allow for polishing of the wafer when the mask plate surface is disposed on a surface of wafer.

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patent: WO 00/59682 (2000-10-01), None
patent: WO 01/63018 (2001-08-01), None

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