Mask pattern data creation method and mask

Details Mask pattern data creation method and mask Mask pattern data creation method and mask

2011-08-16

2011-08-16

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

07998642

ABSTRACT:
A mask pattern data creation method includes: determining whether or not a spacing of adjacent assist pattern feature data is not more than a prescribed spacing, based on: initial position data indicating an initially set position of the assist pattern feature data determined based on an illumination condition; and initial size data indicating an initially set size of the assist pattern feature data satisfying a size condition to not optically form an image on the transfer destination; and moving at least one of the adjacent assist pattern feature data or reducing a size of the at least one to increase the spacing of the assist pattern feature data to exceed a prescribed spacing in the case where it is determined that the spacing of the assist pattern feature data is not more than the prescribed spacing.

REFERENCES:
patent: 7332250 (2008-02-01), Misaka
patent: 2006/0040189 (2006-02-01), Yang
patent: 2006/0246362 (2006-11-01), Yasuzato
patent: 2006/0281016 (2006-12-01), O'Brien
patent: 2007/0026322 (2007-02-01), Yang
patent: 2007-034207 (2007-02-01), None
patent: 2008-066586 (2008-03-01), None

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