Mask, method of producing mask, and method of producing...

Details Mask, method of producing mask, and method of producing... Mask, method of producing mask, and method of producing...

2006-06-06

2006-06-06

Le, Thao X. (Department: 2814)

Active solid-state devices (e.g., transistors, solid-state diode

Alignment marks

C438S975000, C257SE23179, C430S005000, C250S492230

Reexamination Certificate

active

07057300

ABSTRACT:
To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns precisely, a method of producing the same, and a method of producing a semiconductor device. A stencil mask having lattice-shaped struts formed by etching a silicon wafer on four regions of a membrane wherein the lattices are offset from each other in the four regions and all of the struts are connected to other struts or the silicon wafer around the membrane (frame), a method of producing a stencil mask, and a method of producing a semiconductor device.

REFERENCES:
patent: 5874198 (1999-02-01), Okino
patent: 5876881 (1999-03-01), Kawata
patent: 5899728 (1999-05-01), Mangat et al.
patent: 6083648 (2000-07-01), Nakasuji et al.
patent: 6277532 (2001-08-01), Yahiro
patent: 6381300 (2002-04-01), Ezaki
patent: 6403268 (2002-06-01), Kawata
patent: 6428937 (2002-08-01), Katakura
patent: 6459090 (2002-10-01), Suzuki
patent: 6531249 (2003-03-01), Katakura
patent: 6534222 (2003-03-01), Suzuki
patent: 6746805 (2004-06-01), Guo et al.
patent: 6768124 (2004-07-01), Suzuki et al.
patent: 6787785 (2004-09-01), Moriya et al.
patent: 61-283121 (1986-12-01), None
patent: 09-0129541 (1997-05-01), None
patent: 10-135103 (1998-05-01), None
patent: 2000-124114 (2000-04-01), None
patent: 2002-050565 (2002-02-01), None
patent: 2002-222765 (2002-08-01), None
International Search Report (English Translation).

Affiliated with

Also associated with

Rating

Mask, method of producing mask, and method of producing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask, method of producing mask, and method of producing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask, method of producing mask, and method of producing... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3681174