Mask, method of producing a device using the mask and aligner wi

Details Mask, method of producing a device using the mask and aligner wi Mask, method of producing a device using the mask and aligner wi

1996-03-26

1998-09-01

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 378 35, G03F 900

Patent

active

058009493

ABSTRACT:
A mask includes a mask substrate on which a mask pattern is formed, a frame for supporting the mask substrate, and at least one alignment mark formed on the frame. The alignment mark is used for positioning the mask substrate on the frame. The invention also includes a method for making a mask comprising the steps of forming at least one alignment mark at a predetermined position on a mask frame, forming a mask pattern on a mask substrate at a predetermined position with respect to the alignment mark, and joining the mask substrate and the mask frame to form a mask. In addition, the method can include the step of joining the mask substrate and the frame in a predetermined positional relationship on the basis of the position of the alignment mark.

REFERENCES:
patent: 4887283 (1989-12-01), Hosono
patent: 5112133 (1992-05-01), Kurosawa et al.
patent: 5128975 (1992-07-01), Iwamoto et al.
patent: 5150391 (1992-09-01), Ebinuma et al.
patent: 5168512 (1992-12-01), Iwamoto et al.
patent: 5225686 (1993-07-01), Edo
patent: 5285488 (1994-02-01), Watanabe et al.
patent: 5317615 (1994-05-01), Ebinuma et al.
patent: 5347561 (1994-09-01), Ebinuma
patent: 5356686 (1994-10-01), Fujioka et al.
patent: 5375157 (1994-12-01), Maehara
patent: 5485495 (1996-01-01), Miyachi et al.

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