Mask, mask producing method and pattern forming method using mas

Details Mask, mask producing method and pattern forming method using mas Mask, mask producing method and pattern forming method using mas

1993-04-30

1996-02-06

Neville, Thomas R.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430269, 430311, 430396, 378 34, 378 35, G03F 900

Patent

active

054895090

ABSTRACT:
A mask includes a first layer which is transparent with respect to an exposure light, and a phase shift mask pattern which is formed on the transparent layer. The pattern includes one or more phase shift regions adapted for transmitting the exposure light impinging thereon and shifting the phase of the transmitted light relative to the phase of light which passes through a portion of the mask having no phase shift layer.

REFERENCES:
patent: 4890309 (1989-12-01), Smith
patent: 5045417 (1991-09-01), Okamoto
patent: 5132186 (1992-07-01), Takeuchi et al.
Toh, Dao, Singh and Daw, "Chromeless Phase-Shifted Masks: A New Approach to Phase-Shifting Masks", Tenth Annual Symposium on Microlithography of Bacus, Sep. 1990.
Levenson et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. ED-29, No. 12, December 1982 is Described in the introductory part of the present specification.

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