Mask, mask manufacturing method, film forming method,...

Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07909932

ABSTRACT:
A mask includes: a base plate having an opening; a chip having an aperture pattern positioned at the opening in the base plate; a plug detachably arranged to the base plate; and a joining member joining the chip and the plug.

REFERENCES:
patent: 4687542 (1987-08-01), Davis et al.
patent: 4915057 (1990-04-01), Boudreau et al.
patent: 7396558 (2008-07-01), Fujimori et al.
patent: 2002/0102754 (2002-08-01), Fujimori et al.
patent: 2004/0123799 (2004-07-01), Clark
patent: 2005/0034810 (2005-02-01), Yamazaki et al.
patent: 2005/0118788 (2005-06-01), Kuwahara et al.
patent: 2005/0133164 (2005-06-01), Fischer et al.
patent: 2006/0150910 (2006-07-01), Han et al.
patent: 1625311 (2005-06-01), None
patent: 2001-237073 (2001-08-01), None
patent: 2002-305079 (2002-10-01), None
patent: 2002-305080 (2002-10-01), None
patent: 2003-100452 (2003-04-01), None
patent: 2003-100460 (2003-04-01), None
patent: 2004-335486 (2004-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Mask, mask manufacturing method, film forming method,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask, mask manufacturing method, film forming method,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask, mask manufacturing method, film forming method,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2622250

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.