Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1999-05-27
2000-03-07
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430296, C03F 900
Patent
active
060338121
ABSTRACT:
In a photomask manufacturing method, third data is generated by multiplying the size of second data by x. Synthetic data is generated by synthesizing first data and the third data using first connection data from the first data and second connection data from the third data. It is verified whether a combination of transistors and wirings in the synthetic data matches with a circuit on which the layout design is based. A portion in which an error is detected by the verification is corrected. First EB drawing pattern data is generated from the first data and first connection data of the corrected synthetic data. Second EB drawing pattern data is generated by multiplying the third data and second connection data of the corrected synthetic data by 1/x. The EB drawing pattern is formed from a first EB drawing pattern formed on a photomask by drawing/exposing the first EB drawing pattern data and a second EB drawing pattern formed on the photomask by drawing/exposing the second EB drawing pattern data while the second EB drawing pattern data is increased by x times with respect to the first EB drawing pattern data.
NEC Corporation
Young Christopher G.
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