Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-01-03
1997-01-14
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430397, 2504911, 2504921, 378 34, 378 35, G03F 900
Patent
active
055938000
ABSTRACT:
A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.
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Ebinuma Ryuichi
Fujioka Hidehiko
Hara Shin-ichi
Maehara Hiroshi
Nose Noriyuki
Canon Kabushiki Kaisha
Rosasco S.
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