Mask holder for microlithography exposure

Details Mask holder for microlithography exposure Mask holder for microlithography exposure

1997-08-07

1998-12-08

Gray, David M.

Photocopying

Projection printing and copying cameras

Detailed holder for original

355 73, G03B 2762, G03B 2758

Patent

active

058478132

ABSTRACT:
Mask holders are disclosed for holding a mask used during a microlithographic exposure. The mask holder comprises an outer frame and an inner frame. The outer frame contacts the periphery of a main surface of the mask to hold the mask. The inner frame is connected to the outer frame, and contacts an inner portion of said main surface of the mask to hold the mask. The mask holder can include one or more electrostatic and/or vacuum chucks, a thermally conductive material that contacts the mask whenever the mask is being held by the mask holder, and/or an electrically conductive material to discharge accumulated electrical charge on the mask during use.

REFERENCES:
patent: 4833051 (1989-05-01), Imamura
patent: 4837123 (1989-06-01), Kato et al.
patent: 4924258 (1990-05-01), Tsutsui
patent: 4963921 (1990-10-01), Kariya et al.
patent: 5012353 (1991-04-01), Yoshino et al.
patent: 5260151 (1993-11-01), Berger et al.
patent: 5301043 (1994-04-01), Ichikawa
patent: 5471279 (1995-11-01), Takizawa
patent: 5477310 (1995-12-01), Lamb, Jr. et al.
patent: 5544213 (1996-08-01), Chiba et al.
patent: 5608773 (1997-03-01), Korenaga
patent: 5621502 (1997-04-01), Bronaugh et al.

Affiliated with

Also associated with

Rating

Mask holder for microlithography exposure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask holder for microlithography exposure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask holder for microlithography exposure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-183555