Mask having transmissive elements and a common sidelobe...

Details Mask having transmissive elements and a common sidelobe... Mask having transmissive elements and a common sidelobe...

2007-09-25

2007-09-25

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

11336229

ABSTRACT:
A mask having transmissive elements and one or more sidelobe inhibitors for sidelobe suppression during a radiation-patterning process is provided. Sidelobe artifacts are mitigated by identifying elements as a function of the radiation wavelength for forming desired profiles on a semiconductor wafer. A diffraction rings is calculated around each of the elements to identify sidelobe interference zones and intersections of diffraction rings are located. When a guard ring around one of the intersections Sidelobe inhibitor is located at the a common sidelobe common overlap region of the guard rings. A method for forming a mask with the addition of sidelobe inhibitors as well as a method for determining the location of placement of sidelobe inhibitors is also disclosed.

REFERENCES:
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patent: 5700606 (1997-12-01), Kobayashi et al.
patent: 5795682 (1998-08-01), Garza
patent: 6258489 (2001-07-01), Stanton et al.
patent: 6291113 (2001-09-01), Spence
patent: 6383691 (2002-05-01), Seitz et al.
patent: 6413684 (2002-07-01), Stanton
patent: 6465138 (2002-10-01), Stanton
patent: 6807519 (2004-10-01), Stanton
patent: 2005/0049839 (2005-03-01), Stanton

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