Mask having a phase shifter and method of manufacturing same

Details Mask having a phase shifter and method of manufacturing same Mask having a phase shifter and method of manufacturing same

1997-03-31

1999-03-23

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, G03F 900

Patent

active

058857354

ABSTRACT:
There is disclosed a mask which includes a first phase shifter layer and a second phase shifter layer formed on the first phase shifter layer and has a structure capable of easily effecting highly precise control of the phase of exposure light and correction for a defect in the phase shifter layers. There are also disclosed a method of manufacturing the mask and a method of forming by use of the mask a pattern which has a smaller local error in pattern dimension and is free of a defect.

REFERENCES:
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patent: 4727234 (1988-02-01), Oprysko et al.
patent: 4874632 (1989-10-01), Nakagawa et al.
patent: 4902530 (1990-02-01), Yasaka et al.
patent: 5035787 (1991-07-01), Parker et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5085957 (1992-02-01), Hosono
patent: 5100503 (1992-03-01), Allman et al.
patent: 5290647 (1994-03-01), Miyazaki et al.

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