Mask handling method, and mask and device or apparatus...

Details Mask handling method, and mask and device or apparatus... Mask handling method, and mask and device or apparatus...

2006-12-26

2006-12-26

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C355S072000

Reexamination Certificate

active

07153612

ABSTRACT:
A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.

REFERENCES:
patent: 4610020 (1986-09-01), La Fiandra et al.
patent: 5608773 (1997-03-01), Korenaga et al.
patent: 6172738 (2001-01-01), Korenaga et al.
patent: 6717159 (2004-04-01), Novak
patent: 0 789 280 (1997-08-01), None
patent: 0 881 538 (1998-12-01), None
patent: 1 061 561 (2000-12-01), None
patent: 9-213626 (1997-08-01), None
patent: WO 00/51172 (2000-08-01), None
“Photomasks with Integral Lasers Mirrors and Calibration of Integral Laser Mirrors on Photomasks,” IBM Technical Disclosure Bulletin 32(5B):19-21 (Oct. 1989).
A copy of the European Search Report dated Sep. 6, 2001, issued in the corresponding European Application No. EP 01 30 1864.
English translation of a Korean Office Action in Korean Application No. 10-2002-0010658, dated Sep. 28, 2005.
Moore et al., Building Scientific Apparatus, A Practical Guide to Design and Construction, Univ. of Maryland, (1983), 5 pages.

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