Mask frame assembly

Coating apparatus – Work surface shields – masks or protectors

Reexamination Certificate

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Details

C118S505000

Reexamination Certificate

active

07987812

ABSTRACT:
A mask assembly configured to prevent the mask from being thermally transformed and to maintain gaps between a plurality of divided pattern masks is disclosed. According to one embodiment, the mask assembly comprises: an open mask that has a plurality of first openings arranged in rows and columns; and a pattern mask that comprises a plurality of unit pattern masks. In some embodiments, the ends of the unit pattern masks may be fixed with respect to the open mask, and the unit pattern mask includes a plurality of mask pattern units configured to align with the plurality of first openings of the open mask. In some embodiments, a tensile force is applied to the unit pattern mask(s).

REFERENCES:
patent: 3226255 (1965-12-01), Cieniewicz et al.
patent: 2003/0101932 (2003-06-01), Kang
patent: 2004/0202821 (2004-10-01), Kim et al.
patent: 2004 014513 (1992-01-01), None
patent: 2003 217850 (2003-07-01), None
patent: 2003-0046090 (2003-06-01), None
patent: 10 2003 0093959 (2003-12-01), None
patent: 2003-0093959 (2003-12-01), None
patent: 10 2004 0084314 (2004-10-01), None
Office Action (Notification of Reasons for Rejection) mailed Apr. 21, 2009 by the Japanese Patent Office for JP App. No. 2005-323862.
Notice to Submit Response by Korean Intellectual Property Office on Jun. 16, 2006.

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