Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1985-07-03
1987-03-03
Martin, Roland E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430321, 378 35, 428704, G03F 900
Patent
active
046475176
ABSTRACT:
The invention relates to a mask for X-ray lithography, in particular, for the manufacture of VLSI semiconductor components, which is economical and reliable in its manufacture. The mask should transfer absorber structures down to the submicron range. Lateral mechanical distortions are avoided by a tension-compensated carrier membrane of simultaneously B and Ge doped silicon. This carrier membrane is also optically more transparent than known Si membranes doped only with B, which facilitates optical alignment of the mask.
REFERENCES:
patent: 3742230 (1973-06-01), Spears et al.
patent: 4468799 (1984-08-01), Harms et al.
Wilson et al, Ion Beams with Applications to Ion Implantation, J. Wiley & Sons, New York, 1973.
Hersener Jurgen
Herzog Hans-Joest
Strohm Karl
Dees Jos,e G.
Licentia Patent-Verwaltungs-GmbH
Martin Roland E.
Telefunken electronic GmbH
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