Mask for use in production of semiconductor arrangements

Details Mask for use in production of semiconductor arrangements Mask for use in production of semiconductor arrangements

1975-03-19

1976-04-20

Rutledge, L. Dewayne

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

29579, 156 16, 156 17, 427282, 428156, H01L 21283

Patent

active

039517012

ABSTRACT:
A mask for use in production of semiconductor arrangements comprises a mask element with projections thereon at a side adapted to face the semiconductor arrangement, the projections being adapted to cooperate with recesses in the semiconductor arrangement to locate the mask element thereon.
The invention also includes a method of producing the semiconductor arrangements.

REFERENCES:
patent: 3133336 (1964-05-01), Marinace
patent: 3144366 (1944-08-01), Rideout et al.
patent: 3697318 (1972-10-01), Feinberg et al.
patent: 3783044 (1974-01-01), Cheskis et al.
patent: 3824014 (1974-07-01), Abita
stevens et al., "Precise Symmetrical Alignment, Etc.," IBM Tech. Disc. Bull., Vol. 14, No. 3, Aug. '71, pp. 749, 750.
Rosvold et al., "Air-Gap Microcircuits, Etc.," IEEE Transactions on Electron Devices, Vol. Ed. 15, No. 9, 9/68, pp. 640-644.

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