Mask for use in a charged particle beam apparatus including beam

Details Mask for use in a charged particle beam apparatus including beam Mask for use in a charged particle beam apparatus including beam

1991-07-05

1993-06-29

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3704

Patent

active

052237192

ABSTRACT:
A charged particle beam mask and apparatus and method of using the same employing a mask that includes a substrate and a plurality of substantially rectangular beam passing sections arranged in parallel and to have a trapezoidal shape. In addition, the masks having a matrix of irradiation areas formed thereon where each irradiation area has a matrix of block patterns, are aligned and selectively irradiated to form a desired pattern on an object.

REFERENCES:
patent: 4145597 (1979-03-01), Yasuda
patent: 4914304 (1990-04-01), Koyama
patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5105089 (1992-04-01), Yamada

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