Mask for the formation of patterns in lacquer layers by means of

Details Mask for the formation of patterns in lacquer layers by means of Mask for the formation of patterns in lacquer layers by means of

1983-08-31

1985-11-26

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

350318, 378 35, 430967, G02B 500, G02B 700, G03F 100

Patent

active

045554609

ABSTRACT:
In a mask for X-ray lithography, in which a pattern of a layer corresponding to the structure to be manufactured and consisting of a material opaque to visible light is applied to a thin diaphragm of a material transparent to X-ray radiation, an adjustment with visible radiation, such as laser light, is made possible using a diaphragm consisting of a material opaque to visible light and using adjustment windows of a material transparent to the visible light of the spectrum through the diaphragm.

REFERENCES:
patent: 3742230 (1973-06-01), Spears et al.
patent: 4152601 (1979-05-01), Kadota et al.
patent: 4260670 (1981-04-01), Burns
patent: 4454209 (1984-06-01), Blais

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