Mask for patterning a microlens

Details Mask for patterning a microlens Mask for patterning a microlens

1997-01-16

1998-11-10

Ben, Loha

Optical: systems and elements

Single channel simultaneously to or from plural channels

By surface composed of lenticular elements

359891, 359893, 359888, G02B 2710

Patent

active

058352740

ABSTRACT:
A mask for patterning a microlens includes a glass substrate, a main light-blocking region formed on a predetermined area of the glass substrate, and auxiliary light-blocking regions formed around the main light-blocking region or on a part of the main light-blocking region such that as the intervals between the main and auxiliary light-blocking regions become longer, the intensity of light transmitted thereto becomes greater.

REFERENCES:
patent: 3909524 (1975-09-01), Ohkoshi et al.
patent: 4157215 (1979-06-01), Hanak
patent: 4674838 (1987-06-01), Hieber et al.
patent: 4762396 (1988-08-01), Dumant et al.
patent: 4928008 (1990-05-01), Huggins et al.
patent: 5016981 (1991-05-01), Peppers et al.
patent: 5301063 (1994-04-01), Tohmon

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