Mask for monitoring defect

Details Mask for monitoring defect Mask for monitoring defect

1996-06-19

1998-11-24

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058404465

ABSTRACT:
The mask of the present invention consists of a first pad provided thereto, a second pad opposing the first pad at a given distance therefrom, a zigzag-shaped line formed to interconnect the first pad and the second pad, and a plurality of unit patterns arranged to interconnect the first pad, the second pad and the line on the quartz substrate. The mask of the present invention makes it possible to have a quantitative, qualitative and classified analysis for the defect because it can not only analyze the occurrence frequency of the defects by the defect inspection system but also can have an electrical measurement.

REFERENCES:
patent: 5405810 (1995-04-01), Mizumo et al.
patent: 5513275 (1996-04-01), Khalaj et al.

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