Mask for light exposure and process for production of the same

Details Mask for light exposure and process for production of the same Mask for light exposure and process for production of the same

1996-03-15

1997-12-23

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430323, 430324, G03F 900

Patent

active

057006059

ABSTRACT:
There is disclosed a mask for light exposure which comprises being provided with a light transparent substrate and a mask pattern formed on the light transparent substrate, the mask pattern comprising a light screening pattern composed of a material which screens the exposure light and transmits the light having the longer wavelength than that of the exposure light and a phase shift pattern formed by engraving a part of the light transparent substrate.

REFERENCES:
patent: 5276551 (1994-01-01), Nakagawa
patent: 5409789 (1995-04-01), Ito
patent: 5480747 (1996-01-01), Vasudev

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