Mask for improving lithography performance by using...

Details Mask for improving lithography performance by using... Mask for improving lithography performance by using...

2006-03-07

2006-03-07

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07008735

ABSTRACT:
Materials and methods for fabricating multi-transmittance halftone phase shift masks (HTPSM) are disclosed. The masks include patterns having regions of different transmittance for the purpose of reducing one or more of line edge shortening, iso-to-dense bias, and edge-to-dense bias. The masks employ at least one halftone material in forming the patterns that have different transmittances. Regions of denser or longer lines are constructed to have a lower transmittance than regions of isolated lines. The patterns may include a single halftone material of different thicknesses for different regions or may include two halftone materials applied singly and doubly to different regions.

REFERENCES:
patent: 6274281 (2001-08-01), Chen
patent: 6841316 (2005-01-01), Crell
patent: 2003/0207183 (2003-11-01), Kikuchi

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