Mask for fabrication of semiconductor devices, process for...

Details Mask for fabrication of semiconductor devices, process for... Mask for fabrication of semiconductor devices, process for...

2005-07-12

2005-07-12

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000

Reexamination Certificate

active

06916582

ABSTRACT:
A mask for fabrication of semiconductor devices in which the membrane layer keeps high strength and is free of stress and distortion even though it is made thin. The mask has a membrane-supporting layer at the peripheral part of the mask pattern or the mask pattern region in the membrane layer constituting the mask.

REFERENCES:
patent: 4256532 (1981-03-01), Magdo et al.
patent: 5362575 (1994-11-01), Trimble
patent: 5728492 (1998-03-01), Kawata
patent: 6319636 (2001-11-01), Ham
patent: 11-054409 (1999-02-01), None

Affiliated with

Also associated with

Rating

Mask for fabrication of semiconductor devices, process for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask for fabrication of semiconductor devices, process for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask for fabrication of semiconductor devices, process for... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3378049