Mask for fabricating semiconductor components

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S311000, C430S322000, C430S323000

Reexamination Certificate

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06849364

ABSTRACT:
A mask for fabricating semiconductor components contains first transparent regions and second transparent regions. The second regions are laid out such that they do not act on the regions of the photoresist directly beneath them in the exposure of the photoresist through the mask. The transparent regions define a size and a shape of structures to be formed.

REFERENCES:
patent: 5242770 (1993-09-01), Chen et al.
patent: 5663893 (1997-09-01), Wampler et al.
patent: 5667918 (1997-09-01), Brainerd et al.
patent: 6503666 (2003-01-01), Pierrat
patent: 6524752 (2003-02-01), Pierrat
patent: 6541165 (2003-04-01), Pierrat

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