Mask for fabricating semiconductor components

Details Mask for fabricating semiconductor components Mask for fabricating semiconductor components

2005-02-01

2005-02-01

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S322000, C430S323000

Reexamination Certificate

active

06849364

ABSTRACT:
A mask for fabricating semiconductor components contains first transparent regions and second transparent regions. The second regions are laid out such that they do not act on the regions of the photoresist directly beneath them in the exposure of the photoresist through the mask. The transparent regions define a size and a shape of structures to be formed.

REFERENCES:
patent: 5242770 (1993-09-01), Chen et al.
patent: 5663893 (1997-09-01), Wampler et al.
patent: 5667918 (1997-09-01), Brainerd et al.
patent: 6503666 (2003-01-01), Pierrat
patent: 6524752 (2003-02-01), Pierrat
patent: 6541165 (2003-04-01), Pierrat

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