Mask for exposure

Details Mask for exposure Mask for exposure

1996-10-10

1998-07-21

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057833362

ABSTRACT:
A mask for exposure includes a light transmitting substrate, a plurality of substantially oblong, island-like light transmitting sections arranged periodically on the substrate, an opaque section formed on the substrate except where the light transmitting sections are arranged, and a plurality of phase shifter layers selectively formed in the light transmitting sections. The light transmitting sections include paired light transmitting sections opposed to each other at one end portion, and one of the phase shifter layers is formed in one of the paired light transmitting sections. An interval between the paired light transmitting sections at one end portion is smaller than an interval between adjacent ones of the light transmitting sections at portions other than the one end portion.

REFERENCES:
patent: 5541025 (1996-07-01), Oi et al.
patent: 5637424 (1997-06-01), Haruki et al.

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