Mask for evaluation of aligner and method of evaluating aligner

Details Mask for evaluation of aligner and method of evaluating aligner Mask for evaluation of aligner and method of evaluating aligner

1993-03-12

1995-07-25

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430321, 355 45, 355132, 355125, G03F 900

Patent

active

054360978

ABSTRACT:
A mask for evaluation of an aligner includes, on a transparent substrate, a plurality of resistance measurement pattern blocks each including a plurality of resistance measurement patterns which have shapes identical to each other. Resistance values of respective measurement patterns of conductive film portions on a substrate exposed and formed by using a mask having a plurality of the same measurement patterns vary in dependency upon the accuracy of a lens, etc. of the aligner. Accordingly, this evaluation mask is used to carry out exposure process to etch a conductive film to measure resistance values of the conductive film portions to compare them to each other, thereby making it possible to carry evaluation of an aligner including evaluation of a lens therefor.

REFERENCES:
patent: 4475811 (1984-10-01), Brunner
patent: 4619524 (1986-10-01), Tabarelli et al.

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