Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Reexamination Certificate
2005-11-17
2009-08-11
Huff, Mark F (Department: 1795)
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
C118S504000, C118S620000, C427S282000, C430S005000
Reexamination Certificate
active
07572338
ABSTRACT:
A mask for depositing a thin film of a flat panel display and a method of fabricating the mask are disclosed. Embodiments of the mask can improve position accuracy and prevent problems caused by thermal expansion of the mask by attaching a reinforcing member and mask pattern units arranged on openings of the reinforcing member using a buffer member. The mask includes a reinforcing member including a plurality of first openings; mask pattern units arranged corresponding to the first openings of the reinforcing member and supported by the reinforcing member; and a buffer member including a plurality of second openings corresponding to the first openings of the reinforcing member, and attaching the reinforcing member to the mask pattern units to support the reinforcing member and the mask pattern units.
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Office Action issued by the Japanese Patent Office on Jun. 16, 2009.
Kim Eui-Gyu
Kim Tae-Hyung
Fraser Stewart A
Huff Mark F
Knobbe Martens Olson & Bear LLP
Samsung SDI & Co., Ltd.
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