Mask for covering the margin of a disk-shaped substrate

Details Mask for covering the margin of a disk-shaped substrate Mask for covering the margin of a disk-shaped substrate

1993-12-08

1996-01-02

Breneman, R. Bruce

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118504, 118505, 118720, 118721, C23C 1434, C23C 1604

Patent

active

054805309

ABSTRACT:
In a mask (7) for covering the outer marginal area of a disk-shaped substrate surface during a coating process, for example a vacuum sputtering or vapor depositing process, the mask (7) is made of an elastic material in the form of a planar plate with an essentially circular opening. To center and lock it onto the substrate (1) an inwardly extending annular flange is provided which assumes the actual masking function and extends in a plane parallel to the plane of the plate. The substrate (1) is laid on this flange and retained by projections extending radially inward. Prior to positioning the substrate it is bowed axially to spread apart the projections.

REFERENCES:
patent: 4473455 (1984-09-01), Dean et al.
patent: 4556968 (1985-12-01), Pelkey et al.
patent: 4634512 (1987-01-01), Allen et al.
patent: 5003530 (1991-03-01), Yamamori
patent: 5089110 (1992-02-01), Allen et al.

Affiliated with

Also associated with

Rating

Mask for covering the margin of a disk-shaped substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask for covering the margin of a disk-shaped substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask for covering the margin of a disk-shaped substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-232931