Mask for an exposure process using X-ray

Details Mask for an exposure process using X-ray Mask for an exposure process using X-ray

1998-07-07

1999-12-14

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 35, G03F 900, G21K 500

Patent

active

060015144

ABSTRACT:
A fabrication process for a mask used in exposure processes using x-rays, which includes first forming and patterning an absorber, and then forming a membrane over it. The fabrication process can avoid the use of a selective etching process on the absorber and the membrane. The mask, according to the invention, can prevent transferred pattern misalignment or displacement or misplacement, and exposure to secondary electrons as well.

REFERENCES:
patent: 4873162 (1989-10-01), Yoshioka et al.

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