Mask film, its manufacturing method, and manufacturing...

Railway draft appliances – Cushioned – Radially movable

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C213S041000, C213S047000, C213S049000, C430S005000, C174S258000, C174S260000, C174S262000, C029S829000, C029S830000, C029S846000

Reexamination Certificate

active

07066344

ABSTRACT:
A mask film includes a base material, a parting layer and a non-parting portion placed on the base material. Accordingly, an optimum adhesion strength of the mask film and a prepreg sheet can be maintained, and peeling between the mask film and prepreg sheet can be prevented. Further, by preventing the fusing adhesion between the mask film and prepreg sheet due to heat generated when forming penetration holes, a circuit board having an excellent quality is obtained.

REFERENCES:
patent: 4268614 (1981-05-01), Ueyama et al.
patent: 4642160 (1987-02-01), Burgess
patent: 4915983 (1990-04-01), Lake et al.
patent: 5346750 (1994-09-01), Hatakeyama et al.
patent: 5358604 (1994-10-01), Lin et al.
patent: 5591519 (1997-01-01), Caron et al.
patent: 5902438 (1999-05-01), Arthur et al.
patent: 5959256 (1999-09-01), Saida et al.
patent: 6163957 (2000-12-01), Jian et al.
patent: 6368697 (2002-04-01), Petti et al.
patent: 1054582 (2000-11-01), None
patent: 1180921 (2002-02-01), None
patent: 6-268345 (1994-09-01), None
patent: 7-106760 (1995-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Mask film, its manufacturing method, and manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask film, its manufacturing method, and manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask film, its manufacturing method, and manufacturing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3694491

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.