Mask feed method and apparatus for exposure replicate systems

Details Mask feed method and apparatus for exposure replicate systems Mask feed method and apparatus for exposure replicate systems

1984-07-03

1986-07-01

Dobeck, B.

Electricity: motive power systems

Positional servo systems

With particular 'error-detecting' means

318577, G05B 106

Patent

active

045982422

ABSTRACT:
A mask feed method and apparatus for deeding and setting with a high degree of positional accuracy a circuit pattern printing mask in a proximity exposure replicate system for printing integrated circuit patterns on a semiconductor wafer. Arranged on the same stage but separated from a wafer chuck is a mask station on which a mask is set a position different from the exposure position and fed to a mask holder at the exposure position for mask feeding purposes. The mask station is provided with its own displacing means for aligning purposes.
Thus, the required movements for mask feeding and alignment purposes are effected by a wafer transfer mechanism.

REFERENCES:
patent: 4103814 (1978-08-01), Nishioka
patent: 4191916 (1980-03-01), Zaiso et al.
patent: 4203064 (1980-05-01), Suzuki et al.
patent: 4342090 (1982-07-01), Caccoma et al.
patent: 4362385 (1982-12-01), Lobach
patent: 4425537 (1984-01-01), Phillips et al.
patent: 4442388 (1984-04-01), Phillips
patent: 4466073 (1984-08-01), Boyan et al.

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