Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-03-07
2010-02-09
Whitmore, Stacy A (Department: 2825)
Image analysis
Applications
Manufacturing or product inspection
C382S145000, C716S030000, C716S030000, C430S005000
Reexamination Certificate
active
07660456
ABSTRACT:
A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
REFERENCES:
patent: 7175952 (2007-02-01), Omori
patent: 7211354 (2007-05-01), Itoh
patent: 2002/0058186 (2002-05-01), Nozawa et al.
patent: 1441461 (2003-09-01), None
patent: 60-84542 (1985-05-01), None
patent: 61-241659 (1986-10-01), None
patent: 10-186635 (1998-07-01), None
patent: 2001-33941 (2001-02-01), None
patent: 2002-296197 (2002-10-01), None
patent: 2003-149793 (2003-05-01), None
patent: 2003-248299 (2003-09-01), None
Aiyama Tamiya
Ishida Hiroyuki
Maruyama Koichi
Hoya Corporation
Sughrue & Mion, PLLC
Whitmore Stacy A
LandOfFree
Mask fabrication supporting method, mask blank providing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask fabrication supporting method, mask blank providing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask fabrication supporting method, mask blank providing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4233087