Mask fabrication supporting method, mask blank providing...

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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Details

C382S145000, C716S030000, C716S030000, C430S005000

Reexamination Certificate

active

07660456

ABSTRACT:
A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.

REFERENCES:
patent: 7175952 (2007-02-01), Omori
patent: 7211354 (2007-05-01), Itoh
patent: 2002/0058186 (2002-05-01), Nozawa et al.
patent: 1441461 (2003-09-01), None
patent: 60-84542 (1985-05-01), None
patent: 61-241659 (1986-10-01), None
patent: 10-186635 (1998-07-01), None
patent: 2001-33941 (2001-02-01), None
patent: 2002-296197 (2002-10-01), None
patent: 2003-149793 (2003-05-01), None
patent: 2003-248299 (2003-09-01), None

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