Gas separation: apparatus – Electric field separation apparatus – Electrode cleaner – apparatus part flusher – discharger – or...
Patent
1975-05-08
1978-01-03
Kimlin, Edward C.
Gas separation: apparatus
Electric field separation apparatus
Electrode cleaner, apparatus part flusher, discharger, or...
96 44, 96 27R, 96 27E, 250492A, G03C 504, G03C 506
Patent
active
040664589
ABSTRACT:
Exposure images may be synthesized on a radiation responsive surface by causing effective relative motion between a mask and the surface. The mask contains at least two distinct exposure areas, each having a plurality of apertures arranged in different patterns from which at least two different images can be simultaneously synthesized. Radiation is directed through the plurality of apertures in a mask during a given period to expose a plurality of similarly shaped areas on a surface. During a second period electrons are similarly directed through the same mask which has been effectively displaced and a second plurality of contiguous areas are exposed. During third and fourth succeeding periods, third and fourth pluralities of contiguous areas are exposed. Thus, the image in each exposure area is synthesized from a plurality of contiguous four step exposure images which makes it possible to eliminate the "stencil problem" and permit exposure of areas whose length is very much greater than their width.
REFERENCES:
patent: 3888673 (1975-06-01), Suzuki et al.
patent: 3936302 (1976-02-01), Takami et al.
International Business Machines - Corporation
Kimlin Edward C.
LandOfFree
Mask-exposure scheme does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask-exposure scheme, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask-exposure scheme will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-278811