Mask element for selective sandblasting and a method

Details Mask element for selective sandblasting and a method Mask element for selective sandblasting and a method

1984-04-19

1986-05-06

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Multilayer

430 18, 430252, 430260, 430262, 430256, 430258, 430271, 430284, 156660, 51310, 51311, 51312, B24B 100, G03C 1112, G03C 180, G03C 170

Patent

active

045871868

ABSTRACT:
A mask element for selective sandblasting comprising a support film layer and, superimposed thereon in the following order, a retainer film layer of a water-insoluble cellulose derivative and a photoresist layer of a pattern mask, said photoresist layer of pattern mask being adapted to adhere to the surface of an article body to be engraved with a strength such that the mask is not detached therefrom during sandblasting. By the use of the mask element of the present invention, a pattern exactly corresponding to that of the mask, even if it is very fine, can be engraved on an article body nicely.

REFERENCES:
patent: 1954672 (1934-01-01), Kavanaugh
patent: 3210187 (1960-04-01), Thommes
patent: 3579926 (1971-05-01), Gaspari
patent: 3808751 (1974-05-01), Usui
patent: 4430416 (1984-02-01), Goto et al.

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