Mask defect inspection computer program product

Details Mask defect inspection computer program product Mask defect inspection computer program product

2007-10-31

2010-10-26

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237400

Reexamination Certificate

active

07821628

ABSTRACT:
A mask defect inspecting method comprises preparing detection sensitivities of defects on a plurality of portions of a mask pattern on a photomask, the detection sensitivities being determined according to influences of the defects upon a wafer, and inspecting defects on the plurality of portions based on the detection sensitivities.

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Notification of Reasons for Rejection, issued by Japanese Patent Office, mailed Mar. 1, 2005, in Japanese Patent Application No. 2002-260428, and English-language translation thereof.

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