Mask defect inspection apparatus

Details Mask defect inspection apparatus Mask defect inspection apparatus

2005-03-18

2008-05-27

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237400

Reexamination Certificate

active

07379176

ABSTRACT:
The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

REFERENCES:
patent: 6100970 (2000-08-01), Yoshino et al.
patent: 6175645 (2001-01-01), Elyasaf et al.
patent: 2002/0088952 (2002-07-01), Rao et al.
patent: 2004/0114824 (2004-06-01), Ogawa et al.
patent: 10-097053 (1998-04-01), None
patent: 2002-039960 (2002-02-01), None

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