Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-12-12
2006-12-12
Mehta, Bhavesh M. (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S141000, C382S149000, C348S126000
Reexamination Certificate
active
07149340
ABSTRACT:
A method and system for detecting defects in a physical mask used for fabricating a semiconductor device having multiple layers is disclosed, where each layer has a corresponding mask. The method and system include receiving a digital image of the mask, and automatically detecting edges of the mask in the image using pattern recognition. The detected edges, which are stored in a standard format, are imported along with processing parameters into a process simulator that generates an estimated aerial image of the silicon layout that would be produced by a scanner using the mask and the parameters. The estimated aerial image is then compared to an intended aerial image of the same layer, and any differences found that are greater than predefined tolerances are determined to horizontal defects. In addition, effects that the horizontal defects may have on adjacent layers are analyzed to discover vertical defects.
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Callan Neal
Filseth Paul
Garza Mario
Taravade Kunal
LSI Logic Corporation
Mehta Bhavesh M.
Strategic Patent Group Inc.
Strege John
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