Mask control system

Details Mask control system Mask control system

1990-12-04

1993-03-02

Smith, Jerry

Boots, shoes, and leggings

156627, G06F 1546, G05B 1302

Patent

active

051915359

ABSTRACT:
A mask control system for a semiconductor production photo engraving process (PEP step), comprising a controller including lot selecting means for selecting a lot from wafer lots to be withdrawn from a step preceding the PEP step, and wafer lots to be processing by the PEP step, and mask searching means for searching a mask corresponding to the lot selected by the lot selecting means; and a output unit for causing the controller to detect locations of mask corresponding to selected lots, and for designating a washing order for the mask detected by the controller when the masks are in a washing step. With the preferred embodiment of the invention, selection of a wafer lot and search of a mask are automatically performed, and washing of masks is carried out according to priority, thereby shortening the time required for the PEP.

REFERENCES:
patent: 4571685 (1986-02-01), Kamoshida
patent: 4700311 (1987-10-01), Tributsch et al.
patent: 4901242 (1990-02-01), Kotan

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