Mask CD measurement monitor outside of the pellicle area

Details Mask CD measurement monitor outside of the pellicle area Mask CD measurement monitor outside of the pellicle area

2004-02-06

2008-09-09

Huff, Mark F. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C382S144000, C356S237500

Reexamination Certificate

active

07422828

ABSTRACT:
A method of fabricating a photomask having a pellicle on a photomask substrate that facilitates accurate measurement of a critical dimension on the photomask, without requiring removal of the pellicle from the photomask substrate. A first pattern is transferred onto the photomask substrate in a first area, and at least one test pattern is transferred onto the photomask substrate outside of the first area. The pellicle is attached to the photomask substrate, wherein the pellicle covers the first area, but does not cover the at least one test pattern.

REFERENCES:
patent: 6311319 (2001-10-01), Tu et al.
patent: 6557163 (2003-04-01), Rankin et al.
patent: 6576374 (2003-06-01), Kim
patent: 6812999 (2004-11-01), Hickman
patent: 2002/0081501 (2002-06-01), Hasegawa et al.
patent: 2002/0102477 (2002-08-01), Tanaka et al.

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