Mask blank substrate set and mask blank set

Details Mask blank substrate set and mask blank set Mask blank substrate set and mask blank set

2011-08-30

2011-08-30

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S394000

Reexamination Certificate

active

08007961

ABSTRACT:
A substrate set is a mask blank substrate set including a plurality of substrates each for use in a mask blank for producing a photomask to be chucked on a mask stage of an exposure apparatus. In each of the substrates in the mask blank substrate set, a main surface, on the side where a thin film for forming a transfer pattern is to be formed, has a convex shape being relatively high at its center and relatively low at its peripheral portion. In each substrate, the flatness in a 142 mm square area, including a central portion, of the main surface is 0.3 μm or less and the difference upon fitting to a reference main surface of a reference substrate is 40 nm or less.

REFERENCES:
patent: 7344808 (2008-03-01), Numanami et al.
patent: 2006/0068300 (2006-03-01), Tanabe et al.
patent: 2003-50458 (2003-02-01), None
patent: 2005043838 (2005-02-01), None
Korean Office Action corresponding to Korean Patent Application No. 10-2009-0092310, mailed Feb. 28, 2011.

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