Mask blank substrate, mask blank, photomask, and methods of...

Details Mask blank substrate, mask blank, photomask, and methods of... Mask blank substrate, mask blank, photomask, and methods of...

2009-08-06

2011-11-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08048593

ABSTRACT:
A mask blank substrate for a photomask is chucked on a mask stage of an exposure apparatus. A main surface, on the side where a thin film for a transfer pattern is to be formed, of the mask blank substrate has a flatness of 0.3 μm or less in a 142 mm square area including its central portion and has a convex shape being relatively high at its central portion and relatively low at its peripheral portion. The difference upon fitting, to the main surface of the mask blank substrate, a virtual reference main surface, having a spherical shape in a 132 mm square area, of a virtual reference substrate is 40 nm or less.

REFERENCES:
patent: 2005/0019676 (2005-01-01), Nakatsu et al.
patent: 2006/0068300 (2006-03-01), Tanabe et al.
patent: 2006/0223224 (2006-10-01), Akagawa
patent: 2010/0081067 (2010-04-01), Tanabe
patent: 2003-050458 (2003-02-01), None

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