Mask blank providing system, mask blank providing method,...

Details Mask blank providing system, mask blank providing method,... Mask blank providing system, mask blank providing method,...

2011-08-16

2011-08-16

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S269000

Reexamination Certificate

active

07998644

ABSTRACT:
A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask manufacturing department, the mask blank manufacturing department provides optical characteristic information (transmittance variation) of the mask blank transparent substrate and optical characteristic information (transmittance variation and/or phase difference variation) of the mask blank to the mask manufacturing department. The optical characteristic information of the mask blank transparent substrate is provided to the mask blank manufacturing department from a materials processing department that manufactures mask blank transparent substrates.

REFERENCES:
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patent: 2004/0063000 (2004-04-01), Maurer et al.
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Chinese Office Action and translation dated Jul. 3, 2009.

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