Mask blank, method of manufacturing an exposure mask, and...

Details Mask blank, method of manufacturing an exposure mask, and... Mask blank, method of manufacturing an exposure mask, and...

2008-02-28

2010-11-23

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07838180

ABSTRACT:
A mask blank includes a substrate and a thin film formed thereon and used to form a pattern. The mask blank is adapted to be subjected to dry etching corresponding to a method of producing an exposure mask by patterning the thin film by dry etching using an etching gas substantially free from oxygen with a resist pattern formed on the thin film used as a mask. The thin film has a protective layer formed at least at its upper layer and containing 60 atomic % or more oxygen. For example, the dry etching is performed by the use of a chlorine-based gas substantially free from oxygen.

REFERENCES:
patent: 2002/0122991 (2002-09-01), Shiota et al.
patent: 2005/0208393 (2005-09-01), Dieu et al.
patent: 2005-530338 (2005-10-01), None
patent: 2006-78825 (2006-03-01), None

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