Mask blank glass substrate, mask blank glass substrate...

Details Mask blank glass substrate, mask blank glass substrate... Mask blank glass substrate, mask blank glass substrate...

2009-06-17

2011-11-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08048591

ABSTRACT:
A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation of a transfer pattern, of the mask blank glass substrate. Each of the pits forming the marker is a round hole with its edge portion being generally circular and a distance L1between the edge portions of the adjacent pits is 50 μm or more. The marker is formed, for example, on an end face of the mask blank glass substrate.

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Japanese Office Action corresponding to Japanese Patent Application No. 2008158765, dated Apr. 20, 2010.

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